SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 200, Issue 1-4 SPEC. ISS., 2005, Pages 232-235

Properties and electrochromic performances of reactively sputtered tungsten oxide films with water as reactive gas

(5) Sadiki, H a Pierson, J F a Rousselot, Christophe a Martin, N b Terwagne, G c

a UNIVERSITÉ DE FRANCHE COMTÉ (France)

b Centre National de la Recherche Scientifique (France)

c LARN (France)

Author keywords

Electrochromic; Reactive sputtering; Tungsten oxide

Indexed keywords

COMPOSITION EFFECTS; CRYSTALLIZATION; ELECTROCHROMISM; FILMS; HYDROGEN; MAGNETRON SPUTTERING; OXYGEN; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTER DEPOSITION; STRUCTURE (COMPOSITION); WATER; X RAY DIFFRACTION ANALYSIS;

ELASTIC RECOIL DETECTION ANALYSIS; REACTIVE GAS; REACTIVE SPUTTERING; TUNGSTEN OXIDE FILMS;

TUNGSTEN COMPOUNDS;

SPUTTERING;

EID: 24644440503 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2005.02.195 Document Type: Article

Times cited : (11)

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