Organosiloxane based bottom antireflective coatings for 193nm lithography

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue I, 2005, Pages 449-458

  Li, Bo ^a   Do, Kim ^a   Stuck, Jason ^a   Xie, Songyuan ^a   Leung, Roger ^a   Nguyen, Tiffany ^a   Gill, Jaswinder ^a   Jin, Lei ^a   Fan, Wenya ^a   Thanawala, Shilpa ^a   Zhou, Faith ^a   Iwamoto, Nancy ^a   Brouk, Emma ^a   Kennedy, Joseph ^a  

^a HONEYWELL   (United States)

Author keywords

193nm Anti reflective Coating; ArF Lithography; Etch Selectivity; Organosiloxane; VFTL Dual Damascene patterning

Indexed keywords

193 NM ANTI-REFLECTIVE COATING; ARF LITHOGRAPHY; ETCH SELECTIVITY; ORGANOSILOXANE; VFTL DUAL DAMASCENE PATTERNING;

ADHESION; METALLIC FILMS; ORGANOMETALLICS; PERMITTIVITY; PHOTORESISTS; PLASMA ETCHING; SILICA; STRUCTURE (COMPOSITION);

COATING TECHNIQUES;

EID: 24644439703     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600015     Document Type: Conference Paper

References (8)

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7. J. Kennedy, T. Baldwin-Hendricks, J. Stuck, A. Suedmeyer, S. Thanawala, K. Do, and N. Iwamoto, "Organosiloxane based Bottom Antireflective Coatings for 193nm Lithography", Proc. SPIE 5039, 929, 2003.
8. J. Kennedy, T. Baldwin-Hendricks, M. Hebert, and A. Suedmeyer, "An Anthracene-Organosiloxane Spin On Antireflective Coating for KrF Lithography", Proc. SPIE 5039, 144, 2003.