SiON based antireflective coating for 193 nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue II, 1999, Pages 1091-1095

  Schiavone, P ^a   Esclope, C ^a   Halimaoui, A ^a  

^a ORANGE LABS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; EXCIMER LASERS; PHOTOCHEMICAL REACTIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON COMPOUNDS;

SILICON OXYNITRIDE;

PHOTORESISTS;

EID: 0032624338     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350160     Document Type: Conference Paper

References (5)