Organosiloxane based bottom antireflective coatings for 193nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 II, Issue , 2003, Pages 929-939

  Kennedy, Joseph ^a   Baldwin Hendricks, Teri ^a   Stuck, Jason ^a   Suedmeyer, Arlene ^a   Thanawal, Shilpa ^a   Do, Kim ^a   Iwamoto, Nancy ^a  

^a HONEYWELL   (United States)

Author keywords

193nm anti reflective coating; ArF lithography; Etch selectivity; Organosiloxane; VFTL dual damascene patterning

Indexed keywords

ACIDITY; COPPER; LITHOGRAPHY; ORGANIC COMPOUNDS; PERMITTIVITY; PH; PHOTORESISTS; PLASMA ETCHING; SILICA; SURFACE PROPERTIES; TEMPERATURE;

BOTTOM ANTIREFLECTIVE COATINGS; DUAL DAMASCENE PATTERNING; ORGANOSILOXANE; PLASMA ETCH RATE; PLASMA ETCH SELECTIVITY;

ANTIREFLECTION COATINGS;

EID: 0141722769     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485158     Document Type: Conference Paper

References (5)

1. P. Schiavone, C. Esclope, A. Halimaoui, "SiON-based antireflective coatings for 193-nm lithography." Proceedings SPIE-Microlithography 1999, Advances in Resist Technology and Processing XVI, 3678, 1091-1095 (1999).
2. M. Hussein, S. Sivakumar, R. Brain, B. Beattie, P. Nguyen, M. Fradkin, "A Novel Approach to Dual Damascene Patterning." Proceedings IEEE-IITC 2002, pg. 18.
3. C. Tan, M. Mukherjee-Roy, W. Jo, R. Kumar, P. Foo, S. Sathappan, S. Ngooi, "Organic BARC process evaluation for via first dual damascene patterning." Proceedings SPIE-Microlithography 2001, Advances in Resist Technology and Processing XVIII, 4345, 804-815 (2001).
4. J.Kennedy, T.Baldwin, N. Hacker, R. Spears, "Spin-on Glass Anti-Reflective Coatings for Photolithography." US Patent #6,268,457
5. B. Coltrain, L. Kelts, "The Chemistry of Hydrolysis and Condensation of Silica Sol-Gel Precursors" Advances in chemistry series 234, 403-18 (1994).