Rinsing and drying effects on heterogeneous substrates

Solid State Phenomena

Volumn 76-77, Issue , 2001, Pages 195-198

  Fyen, W ^a   Vos, R ^a   Devriendt, K ^a   Meuris, M ^a   Mertens, P ^a   Heyns, M ^a  

^a IMEC   (Belgium)

Author keywords

Drying; Heterogeneous substrate; Post CMP cleaning; Rinsing

Indexed keywords

ALUMINA; ALUMINUM OXIDE; CHEMICAL MECHANICAL POLISHING; DISSIMILAR MATERIALS; SUBSTRATES; TOPOGRAPHY;

CHEMICAL MECHANICAL POLISHING(CMP); HETEROGENEOUS SUBSTRATES; HETEROGENEOUS SURFACE; HYDROPHOBIC SUBSTRATE; POST-CMP CLEANING; RINSING; SELECTIVE DEPOSITION; SHALLOW TRENCH ISOLATION;

DRYING;

EID: 24544472163     PISSN: 10120394     EISSN: 16629779     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/SSP.76-77.195     Document Type: Conference Paper

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