Near-surface sensitive infrared reflection spectroscopy on SiO2 implanted with high-flux negative ions

Vacuum

Volumn 74, Issue 3-4 SPEC. ISS., 2004, Pages 549-553

  Amekura, H ^a   Umeda, N ^b   Kishimoto, N ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

High flux implantation; Infrared reflection spectroscopy; Ion implantation; IR Penetration effect; Nanoparticle; SiO2

Indexed keywords

COPPER; INFRARED RADIATION; INFRARED SPECTROSCOPY; ION IMPLANTATION; NANOSTRUCTURED MATERIALS; SPUTTERING; THERMOCOUPLES;

HIGH-FLUX NEGATIVE IONS; INFRARED REFLECTION SPECTROSCOPY;

SILICA;

EID: 2442669385     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2004.01.026     Document Type: Article

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