Annealing behavior of tin implanted silica

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 141, Issue 1-4, 1998, Pages 279-283

  Tung, Y S ^a   Ueda, A ^a   Mu, R ^a   Wu, M ^a   Chen, J ^a   Gu, Z ^a   Henderson, D O ^a   Collins, W E ^a   White, C W ^b   Zhur, R ^b  

^a FISK UNIVERSITY   (United States)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

Infrared spectroscopy; Ion implantation; Krainers Kronig transformation

Indexed keywords

ANNEALING; CHEMICAL BONDS; INFRARED SPECTROSCOPY; SILICA; SUBSTRATES; TIN;

KRAMERS KRONIG TRANSFORMATION;

ION IMPLANTATION;

EID: 0032067265     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(98)00137-2     Document Type: Article

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