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Volumn 47, Issue , 2004, Pages

PowerPC 970 in 130nm and 90nm technologies

Author keywords

[No Author keywords available]

Indexed keywords

GATE OXIDES; POWER SAVINGS; VOLTAGE SCALING;

EID: 2442663906     PISSN: 01936530     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (12)

References (6)
  • 1
    • 0036504519 scopus 로고    scopus 로고
    • Power4 system design for high reliability
    • Mar.
    • D.C. Bossen, et al., "Power4 System Design for High Reliability," IEEE Micro, vol. 22, no. 2, pp. 16-24, Mar. 2002.
    • (2002) IEEE Micro , vol.22 , Issue.2 , pp. 16-24
    • Bossen, D.C.1
  • 2
    • 2442714727 scopus 로고    scopus 로고
    • PowerPC 970: First in a new family of 64-bit high performance PowerPC processors
    • Oct.
    • P. Sandon,"PowerPC 970: First in a New Family of 64-bit High Performance PowerPC Processors," Microprocessor Forum, Oct. 2002.
    • (2002) Microprocessor Forum
    • Sandon, P.1
  • 3
    • 2442691247 scopus 로고    scopus 로고
    • Synchronous wave-pipelined interface
    • Aug.
    • F. Ferriaolo, "Synchronous Wave-Pipelined Interface," Hot Chips, Aug. 1999.
    • (1999) Hot Chips
    • Ferriaolo, F.1
  • 4
    • 2442669250 scopus 로고    scopus 로고
    • PowerTune: Advanced frequency and power scaling on PowerPC 970+
    • Feb.
    • Cedric Lichtenau et al., "PowerTune: Advanced Frequency and Power Scaling on PowerPC 970+," ISSCC Dig. Tech. Papers, pp. 356-357, Feb. 2004.
    • (2004) ISSCC Dig. Tech. Papers , pp. 356-357
    • Lichtenau, C.1
  • 5
    • 0032254781 scopus 로고    scopus 로고
    • Scalability of SOI technology into 0.13μm 1.2V CMOS generation
    • E. Leobandung et al., "Scalability of SOI Technology into 0.13μm 1.2V CMOS Generation," IEEE Electron Devices Meeting Digest, pp. 403-406, 1998.
    • (1998) IEEE Electron Devices Meeting Digest , pp. 403-406
    • Leobandung, E.1
  • 6
    • 0036923996 scopus 로고    scopus 로고
    • A high performance 90nm SOI technology with 0.992mm 6T-SRAM cell
    • Dec.
    • M. Khare et al., "A High Performance 90nm SOI Technology with 0.992mm 6T-SRAM Cell," IEEE Electron Devices Meeting Digest, pp. 407-410, Dec. 2002.
    • (2002) IEEE Electron Devices Meeting Digest , pp. 407-410
    • Khare, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.