Optical transmission of silica glass during swift-heavy-ion implantation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 219-220, Issue 1-4, 2004, Pages 294-298

  Plaksin, Oleg ^a,b   Okubo, Nariaki ^c   Takeda, Yoshihiko ^a   Amekura, Hiroshi ^a   Kono, Kenichiro ^a   Kishimoto, Naoki ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b SSC RF   (Russian Federation)

^c UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

Heavy ion implantation; In situ measurements; Metal nanoparticles; Optical transmission; Silica glass

Indexed keywords

ION BEAMS; ION IMPLANTATION; KINETIC ENERGY; LIGHT TRANSMISSION; NANOSTRUCTURED MATERIALS; PHOTONS; PRECIPITATION (CHEMICAL); SPUTTERING; SURFACE PLASMON RESONANCE;

METAL NANOPARTICLES; RESIDUAL ABSORPTION (RA); TRANSIENT ABSORPTION (TA);

FUSED SILICA;

EID: 2442630310     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2004.01.071     Document Type: Conference Paper

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