Study on facing-target sputtering assisted by microwave plasma for enhanced ionization of sputtered atoms

Vacuum

Volumn 74, Issue 3-4 SPEC. ISS., 2004, Pages 521-524

  Yonesu, Akira ^a   Watashi, Suguru ^a   Kagawa, Kiyotaka ^a   Yamashiro, Yasumasa ^a  

^a UNIVERSITY OF THE RYUKYUS   (Japan)

Author keywords

Electron cyclotron resonance; Facing target sputtering; Ionized physical vapor deposition; Low pressure sputtering; Microwave plasma

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; INDUCTIVELY COUPLED PLASMA; IONIZATION; PHYSICAL VAPOR DEPOSITION; PLASMA THEORY; PRESSURE EFFECTS; SPUTTERING;

FACING TARGET SPUTTERING; IONIZED PHYSICAL VAPOR DEPOSITION; LOW PRESSURE SPUTTERING; MICROWAVE PLASMA;

MICROWAVES;

EID: 2442616782     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2004.01.047     Document Type: Article

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