Current-voltage characteristics of high-resistive ZnO thin films deposited by RF magnetron sputtering

Vacuum

Volumn 74, Issue 3-4 SPEC. ISS., 2004, Pages 567-570

  Kawamura, H ^a   Yamada, H ^a   Takeuchi, M ^a   Yoshino, Y ^a   Makino, T ^a   Arai, S ^a  

^a MURATA MANUFACTURING CO LTD   (Japan)

Author keywords

Current voltage characteristic; Internal stress; Polarity; Sputtering; ZnO

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CONDUCTIVITY; ELECTRON MOBILITY; LIGHT EMITTING DIODES; MAGNETRON SPUTTERING; PIEZOELECTRICITY; RESIDUAL STRESSES; ZINC COMPOUNDS;

GAS PRESSURE; POLARITY;

THIN FILMS;

EID: 2442608354     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2004.01.028     Document Type: Article

References (4)

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