Correction masks for thickness uniformity in large-area thin films

Applied Optics

Volumn 39, Issue 10, 2000, Pages 1602-1610

  Villa, Francisco ^a   Martínez, Amalia ^a   Regalado, Luis E ^a  

^a CENTRO DE INVESTIGACIONES EN ÓPTICA   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

SUBSTRATES; THICKNESS MEASUREMENT; VAPORS; VECTORS;

VAPOR SOURCES;

THIN FILMS;

EID: 0043184376     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.39.001602     Document Type: Article

References (12)

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