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Volumn , Issue , 1998, Pages 281-286
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Optimizing source location for control of thickness uniformity
a
a
Denton Vacuum
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(United States)
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Author keywords
[No Author keywords available]
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Indexed keywords
DEPOSITION;
EVAPORATION;
MATHEMATICAL MODELS;
SUBSTRATES;
THICKNESS CONTROL;
SOURCE LOCATION;
THICKNESS CONFORMITY;
COATINGS;
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EID: 0031619185
PISSN: 07375921
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (6)
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References (3)
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