Comment on "ion energy uniformity in high-frequency capacitive discharges" [Appl. Phys. Lett. 86, 021501 (2005)]

Applied Physics Letters

Volumn 87, Issue 7, 2005, Pages

  Howling, A A ^a   Sansonnens, L ^a   Schmidt, H ^a   Hollenstein, Ch ^a  

^a EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 24144491118     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2012528     Document Type: Review

References (6)

1. A. Perret, P. Chabert, and J.-P. Booth, Appl. Phys. Lett. 86, 021501 (2005).
2. H. Schmidt, L. Sansonnens, A. A. Howling, C. Hollenstein, M. Elyaakoubi, and J. P. M. Schmitt, J. Appl. Phys. 95, 4559 (2004).
3. J. Ballutaud, C. Hollenstein, A. A. Howling, L. Sansonnens, H. Schmidt, and J. P. M. Schmitt, Proceedings of the 16th International Symposium Plasma Chemistry ISPC16, edited by, R. D'Agostino, 22-27 June 2003, Taormina, Italy.
4. M. A. Lieberman, J. P. Booth, P. Chabert, J. M. Rax, and M. M. Turner, Plasma Sources Sci. Technol. 11, 283 (2002).
5. A. Garscadden and K. G. Emeleus, Proc. Phys. Soc. 79, 535 (1962).
6. A. A. Howling, L. Sansonnens, J. Ballutaud, C. Hollenstein, and J. P. M. Schmitt, J. Appl. Phys. 96, 5429 (2004).