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Volumn 149, Issue 5, 2002, Pages
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High-temperature kinetics of AlCl3 decomposition in the presence of additives for chemical vapor deposition
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Author keywords
[No Author keywords available]
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Indexed keywords
ADDITIVES;
ATOMS;
CHEMICAL VAPOR DEPOSITION;
FREE RADICALS;
HIGH TEMPERATURE EFFECTS;
METALLIC FILMS;
MIXTURES;
PYROLYSIS;
REACTION KINETICS;
HIGH-TEMPERATURE KINETICS;
ALUMINUM COMPOUNDS;
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EID: 0036571994
PISSN: 00134651
EISSN: None
Source Type: Journal
DOI: 10.1149/1.1467366 Document Type: Article |
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Times cited : (26)
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References (17)
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