Gas-phase kinetic modeling of the AlCl3 decomposition in the AlCl3-CO2-H2-HCl system for a hot-wall CVD reactor

Journal of the Electrochemical Society

Volumn 152, Issue 5, 2005, Pages

  Tan, Pengfu ^a,b   Müller, Jürgen ^a,c   Neuschütz, Dieter ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

^b Mount Isa Mines Ltd   (Australia)

^c CemeCon AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; DECOMPOSITION; MATHEMATICAL MODELS; MIXTURES; PARAMETER ESTIMATION; REACTION KINETICS; TRANSPORT PROPERTIES;

FLOW RATE; GAS-PHASE MODELING; ISOTHERMAL ZONES; RESIDENCE TIME;

ALUMINUM COMPOUNDS;

EID: 20344396354     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1883236     Document Type: Article

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