Microstructure and magnetoresistance of sputtered bismuth thin films upon annealing

Journal of Applied Physics

Volumn 98, Issue 2, 2005, Pages

  Chang, Joonyeon ^a   Kim, Hijung ^a   Han, Junhyun ^a   Jeon, M H ^b   Lee, W Y ^b  

^a Korea Institute of Science and Technology   (South Korea)

^b Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BISMUTH THIN FILMS; ELECTROCHEMICAL METHODS; ELECTRON BACKSCATTERED DIFFRACTION (EBSD); GRAIN BOUNDARY SCATTERING; MICROPATTERNING;

ACTIVATION ENERGY; ANISOTROPY; BISMUTH; ETCHING; GRAIN SIZE AND SHAPE; MAGNETORESISTANCE; MICROSTRUCTURE; PHONONS; POLYCRYSTALLINE MATERIALS; RAPID THERMAL ANNEALING; SCATTERING;

THIN FILMS;

EID: 23844522890     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1989433     Document Type: Article

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