Formation of low-dielectric-constant interlayer films by plasma-enhanced chemical vapor deposition employing hexamethyldisiloxane

Journal of Wide Bandgap Materials

Volumn 6, Issue 3, 1998, Pages 232-240

  Fujii, Toshiaki ^a   Hiramatsu, Mineo ^a   Nawata, Masahito ^a  

^a MEIJO UNIVERSITY   (Japan)

Author keywords

HMDSO; Low dielectric constant; Multilevel interconnection; PECVD

Indexed keywords

COMPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GLASS TRANSITION; OPTICAL INTERCONNECTS; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON COMPOUNDS; THERMODYNAMIC STABILITY;

HMDSO; LOW DIELECTRIC CONSTANT; METHYL SILOXANE STRUCTURE; MULTILEVEL INTERCONNECTION; RADIO FREQUENCY;

DIELECTRIC FILMS;

EID: 23844472771     PISSN: 1524511X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (10)

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