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Volumn 98, Issue 2, 2005, Pages
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The influence of defects and postdeposition treatments on the free carrier density in lightly phosphorus-doped large-grained polycrystalline silicon films
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Author keywords
[No Author keywords available]
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Indexed keywords
IMPEDANCE ANALYSIS;
POSTDEPOSITION TREATMENTS;
POSTHYDROGENATION ANNEALING;
SHEET RESISTANCE;
CONCENTRATION (PROCESS);
DIFFUSION;
DOPING (ADDITIVES);
ELECTRIC CONDUCTIVITY;
HYDROGENATION;
PHOSPHORUS;
POLYCRYSTALLINE MATERIALS;
RAPID THERMAL ANNEALING;
SEMICONDUCTOR DIODES;
SILICON;
SILICON SOLAR CELLS;
THIN FILMS;
CARRIER CONCENTRATION;
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EID: 23844453748
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1977197 Document Type: Article |
Times cited : (3)
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References (22)
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