SCOPUS 정보 검색 플랫폼

Volumn 310, Issue 1-2, 1997, Pages 156-160

A study of the effects of annealing and outgassing on hydrogenated amorphous silicon

Author keywords

Annealing; Hydrogenated amorphous silicon; Outgassing

Indexed keywords

AMORPHOUS SILICON; ANNEALING; CHEMICAL VAPOR DEPOSITION; DEGASSING; HYDROGEN; HYDROGENATION; THIN FILMS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD);

AMORPHOUS FILMS;

EID: 0031275996 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(97)00396-9 Document Type: Article

Times cited : (11)

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