On the formation kinetics of thin nanopatterned layers on silicon wafers created by hydrogen plasma exposure

Materials Research Society Symposium Proceedings

Volumn 849, Issue , 2005, Pages 103-108

  Job, R ^a   Huang, Y L ^a   Ma, Y ^a   Zolgert B ^a   Dungen W ^a  

^a UNIVERSITY OF HAGEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

HYDROGEN; HYDROGENATION; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; THERMAL EFFECTS;

CZOCHRALSKI SILICON (CZ SI) WAFERS; HYDROGEN PLASMAS; POST-HYDROGENATION ANNEALING; THIN NANOPATTERNED LAYERS;

SILICON WAFERS;

EID: 23844435271     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (13)

1. J.I. Pankove, N.M. Johnson, Hydrogen in Semiconductors (Academic Press, New York, 1991).
2. S.J. Pearton, J.W. Corbett, M. Stavola, Hydrogen in Crystalline Semiconductors (Springer, Berlin, Heidelberg, New York, 1992).
3. R. Job, M.F. Beaufort, J.F. Barbot, A.G. Ulyashin, W.R. Fahrner, MRS Symp. Proc. Series 719, 217 (2002).
4. R. Job, A.G. Ulyashin, W.R. Fahrner, M.F. Beaufort, J.F. Barbot, The European Physical Journal - Applied Physics 23, 25 (2003).
5. R. Job, Y. Ma, A.G. Ulyashin, MRS Symp. Proc. Series 788, 571 (2004).
6. Y. Ma, R. Job, Y.L. Huang, W.R. Fahrner, M.F. Beaufort, J.F. Barbot, J. Electrochem. Soc. 151, G627 (2004).
7. R. Job, Y. Ma, Y.L. Huang, W. Düngen, Electrochem. Soc. Proc., 2004-05; 407 (2004).
8. F. Lu, J.W. Corbett, L.C. Snyder, Phys. Lett. A 133, 249 (1988).
9. R.C. Bingham, M.J.S. Dewar, D.C. Lo, J. Am. Chem. Soc. 97, 1285 (1975).
10. J. Perrin, J. Non-Cryst. Solids 137-138, 639 (1991).
11. K. Nakamura, K. Yoshino and S. Takeoka, I. Shimizu, Jpn. J. Appl. Phys. 34, 442 (1995).
12. A. Mutsuda, T. Goto, MRS Symp. Proc. Series 164, 3 (1990).
13. Y.L. Huang, Y. Ma, R. Job, K. Meusinger, M. Scherff, W.R. Fahner, submitted to J. Electrochem. Soc.