Photovoltaic characteristics of a-C:H films prepared on p-Si by plasma CVD

New Diamond and Frontier Carbon Technology

Volumn 15, Issue 3, 2005, Pages 151-157

  Akasaka, Hiroki ^a   Aoki, Yuichi ^a   Ohtake, Naoto ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Amorphous carbon films; Photovoltaic characteristics; Plasma CVD; Sp 2 cluster

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; DOPING (ADDITIVES); ELECTRON ENERGY LEVELS; PHOTOVOLTAIC EFFECTS; PLASMAS; SILICON; WEAR RESISTANCE;

BAND GAP; BIAS VOLTAGE; CARBON CONTENT; NITROGEN ATOMS;

THIN FILMS;

EID: 23844434416     PISSN: 13449931     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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