Effect of O2 partial pressure and thickness on the gasochromic properties of sputtered V2O5 films

Journal of Materials Science

Volumn 40, Issue 13, 2005, Pages 3467-3474

  Shanak, H ^a   Schmitt, H ^a   Nowoczin, J ^a   Ehses, K H ^a  

^a SAARLAND UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DIODES; ELECTRIC RESISTANCE; GAS DYNAMICS; INFRARED RADIATION; LIGHT TRANSMISSION; OPACITY; OXYGEN; PARTIAL PRESSURE; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; VANADIUM COMPOUNDS; X RAY DIFFRACTION;

ELECTRICAL SHEET RESISTANCE; GASOCHROMISM; OPTICAL BAND GAPS; SPUTTERED FILMS;

MOLECULAR DYNAMICS;

EID: 23744474788     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10853-005-2851-5     Document Type: Article

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