Effect of crystallization temperature on microstructure and ferroelectric properties of (Bi,Nd)4Ti3O12 thin films prepared by chemical solution deposition

Materials Science and Engineering: B

Volumn 122, Issue 2, 2005, Pages 164-168

  Hou, Fang ^a   Shen, Mingrong ^a  

^a SOOCHOW UNIVERSITY   (China)

Author keywords

Chemical solution deposition; Crystalline temperature; Ferroelectric films

Indexed keywords

BISMUTH COMPOUNDS; CRYSTALLIZATION; FERROELECTRIC MATERIALS; GRAIN SIZE AND SHAPE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROSTRUCTURE; PERMITTIVITY;

CHEMICAL SOLUTION DEPOSITION (CSD); CRYSTALLINE TEMPERATURE; FATIGUE-FREE CHARACTERISTICS; FERROELECTRIC FILMS;

THIN FILMS;

EID: 23144463685     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2005.05.012     Document Type: Article

References (16)

1. M.S. Tomar, R.E. Melgarejo, and A. Hidalgo Appl. Phys. Lett. 83 2003 341
2. T. Kojima, T. Watanabe, H. Funakubo, K. Saito, M. Osada, and M. Kakihana J. Appl. Phys. 93 2003 1707
3. T. Hayashi, N. Iizawa, D. Togawa, M. Yamada, W. Sakamoto, and S.I. Irano Jpn. J. Appl. 42 2003 1660
4. M. Yamada, N. Iizawa, T. Yamaguchi, W. Sakamoto, K. Kikuta, T. Yogo, T. Hayashi, and S.I. Hirano Jpn. J. Appl. Phys. 42 2003 5222
5. U. Chon, K.B. Kim, H.M. Jang, and G.C. Yi Appl. Phys. Lett. 79 2001 3137
6. U. Chon, J.S. Shim, and H.M. Jang J. Appl. Phys. 93 2003 1707
7. U. Chon, H.M. Jang, M.G. Kim, and C.H. Chang Phys. Rev. Lett. 89 2002 087601
8. T. Kojima, T. Sakai, T. Watanabe, H. Funakubo, K. Saito, and M. Osada Appl. Phys. Lett. 80 2002 2746
9. H. Uchida, H. Yoshikawa, I. Okada, H. Matsuda, T. Iijima, T. Watanabe, T. Kojima, and H. Funakubo Appl. Phys. Lett. 81 2002 2229
10. H. Maiwa, N. Iizawa, D. Togawa, T. Hayashi, W. Sakamoto, M. Yamada, and S. Hirano Appl. Phys. Lett. 82 2003 1760
11. J. Kim, S.H. Kim, J.P. Kim, Y.H. Hwang, and M.S. Jang J. Kor. Phys. Soc. 35 1999 S1465
12. S.J. Yeom, W.S. Yang, N.K. Kim, S.Y. Kweon, E.S. Choi, and J.S. Roh Jpn. J. Appl. Phys. 42 2003 L182
13. S.O. Ryu, W.J. Lee, W.C. Lee, W.C. Shin, I.K. You, S.M. Cho, S.M. Yoon, B.G. Yu, J.K. Koo, and J.D. Kim Jpn. J. Appl. Phys. 42 2003 1665
14. H. Uchida, H. Yshikawa, I. Okada, H. Matsuda, T. Iijima, T. Watanabe, T. Kojima, and H. Funakubo Appl. Phys. Lett. 81 2002 2229
15. D.H. Bao, T.W. Chiu, N. Wakiya, K. Shinozaki, and N. Mizutani J. Appl. Phys. 93 2003 497
16. Y.M. Sun, Y.C. Chen, J.Y. Gan, and J.C. Hwang Appl. Phys. Lett. 81 2002 3221