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Volumn 2328, Issue , 2002, Pages 879-887

Distributed simulation of silicon-based film growth

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER AIDED SOFTWARE ENGINEERING; DISTRIBUTED COMPUTER SYSTEMS; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; USER INTERFACES; VISUALIZATION;

EID: 23044532349     PISSN: 03029743     EISSN: 16113349     Source Type: Book Series    
DOI: 10.1007/3-540-48086-2_98     Document Type: Conference Paper
Times cited : (9)

References (12)
  • 4
    • 0001830549 scopus 로고    scopus 로고
    • Simulation of the growth of hydrogenated amorphous silicon films from an rf plasma
    • Yu.E. Gorbachev, M.A. Zatevakhin, I.D. Kaganovich. Simulation of the growth of hydrogenated amorphous silicon films from an rf plasma. Tech. Phys. V. 41, N 12, 1996, pp. 1247-1258
    • (1996) Tech. Phys , vol.41 , Issue.12 , pp. 1247-1258
    • Gorbachev, Y.1    Zatevakhin, M.A.2    Kaganovich, I.D.3
  • 6
    • 0026875976 scopus 로고
    • High-Resolution, Nonoscillatory Schemes for Unsteady Compressible Flows
    • Yang J.Y., Hsu C.A. High-Resolution, Nonoscillatory Schemes for Unsteady Compressible Flows. AIAA J., V. 30, N 6, 1992, pp. 1570-1575
    • (1992) AIAA J. , vol.30 , Issue.6 , pp. 1570-1575
    • Yang, J.Y.1    Hsu, C.A.2
  • 7
    • 0021526432 scopus 로고    scopus 로고
    • A class of bidiagonal schemes for solving the Euler Equations
    • F. Casier, H. Deconinck, Ch. Hirsch. A class of bidiagonal schemes for solving the Euler Equations. AIAA J. V. 22, N 11, pp. 1556-1563
    • AIAA J. V , vol.22 , Issue.11 , pp. 1556-1563
    • Casier, F.1    Deconinck, H.2    Hirsch, C.H.3
  • 9
    • 4243374322 scopus 로고    scopus 로고
    • Regular grid generation with mechanical approach
    • (in Russian)
    • A.A. Ignatiev. Regular grid generation with mechanical approach. Mathematical Modeling, V. 12, N 2, 2000, pp. 101-105 (in Russian)
    • (2000) Mathematical Modeling , vol.12 , Issue.2 , pp. 101-105
    • Ignatiev, A.A.1
  • 10
    • 0000676645 scopus 로고    scopus 로고
    • A self-consistent fluid model for RF dischargdes in SiH4-H2 compared to experiments
    • G.J. Nienhuis, W.J. Goedheer, E.A.G. Hamers, W.G.J.H.M. van Sark, and J. Bezemer, A self-consistent fluid model for RF dischargdes in SiH4-H2 compared to experiments. J. Appl. Phys. V.82, 1997, pp.2060-2071
    • (1997) J. Appl. Phys , vol.82 , pp. 2060-2071
    • Nienhuis, G.J.1    Goedheer, W.J.2    Hamers, E.3    Van Sark, W.4    Bezemer, J.5
  • 11
    • 0034338677 scopus 로고    scopus 로고
    • Special Features of the Growth of Hydrogenated Amorphous Silicon in PECVD reactors
    • Yu.E. Gorbachev, M.A. Zatevakhin, V.V. Krzhizhanovskaya, V.A. Schweigert. Special Features of the Growth of Hydrogenated Amorphous Silicon in PECVD reactors. Tech. Phys. V. 45 N 8, 2000, pp.1032-1041
    • (2000) Tech. Phys , vol.45 , Issue.8 , pp. 1032-1041
    • Gorbachev, Y.1    Zatevakhin, M.A.2    Krzhizhanovskaya, V.V.3    Schweigert, V.A.4
  • 12
    • 84947599170 scopus 로고    scopus 로고
    • http://www.science.uva.nl/research/scs/Software/


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.