Scanning capacitance microscopy imaging of silicon metal-oxide-semiconductor field effect transistors

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 4, 2000, Pages 2034-2038

  Kleiman, R N ^a   O'Malley, M L ^a   Baumann, F H ^a   Garno, J P ^a   Timp, G L ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 23044523173     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (7)

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5. M. L. O'Malley, G. L. Timp, S. V. Moccio, F. H. Baumann, J. P. Garno, and R. N. Kleiman, Appl. Phys. Lett. 74, 272 (1999).
6. R. N. Kleiman, M. L. O'Malley, F. H. Baumann, J. P. Garno, W. Timp, and G. L. Timp, VLSI Tech. Symp. Dig. 138 (1998).
7. G. L. Timp et al., Tech. Dig. Int. Electron Devices Meet. 615 (1998).