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Thin Solid Films

Volumn 488, Issue 1-2, 2005, Pages 194-199

Properties of anatase CoxTi1-xO2 thin films epitaxially grown by reactive sputtering

(6) Jeong, B S a Heo, Y W a Norton, D P a Hebard, A F b Budai, J D c Park, Y D d

a University of Florida (United States)

b UNIVERSITY OF FLORIDA (United States)

c OAK RIDGE NATIONAL LABORATORY (United States)

d Seoul National University (South Korea)

Author keywords

Magnetic structures; Sputtering; Titanium oxide

Indexed keywords

COBALT COMPOUNDS; EPITAXIAL GROWTH; FERROMAGNETIC MATERIALS; MAGNETIC SEMICONDUCTORS; MOLECULAR BEAMS; PULSED LASER DEPOSITION; SEMICONDUCTOR MATERIALS; SPECTROSCOPIC ANALYSIS; SPUTTERING; SURFACE STRUCTURE; TITANIUM OXIDES; X RAY PHOTOELECTRON SPECTROSCOPY;

CURIE TEMPERATURE; MAGNETIC STRUCTURE; MAGNETIZATION MEASUREMENTS; REACTIVE SPUTTERING;

THIN FILMS;

EID: 23044484448 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2005.04.113 Document Type: Article

Times cited : (15)

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