Laser-assisted atomic layer deposition of boron nitride thin films

Chemical Vapor Deposition

Volumn 11, Issue 6-7, 2005, Pages 330-337

  Olander, Jenny ^a   Ottosson, L Mikael ^a   Heszler, Peter ^a,b   Carlsson, Jan Oho ^a   Larsson, Karin M E ^a  

^a UPPSALA UNIVERSITY   (Sweden)

^b RESEARCH GROUP ON LASER PHYSICS   (Hungary)

Author keywords

Ab initio calculations; ALD; Boron nitride; LALD; Laser irradiation

Indexed keywords

BORON COMPOUNDS; CHEMICAL VAPOR DEPOSITION; COATINGS; EXCIMER LASERS; FILM GROWTH; LASER BEAM EFFECTS; OXIDATION; REACTION KINETICS; STOICHIOMETRY; X RAY DIFFRACTION ANALYSIS;

AB INITIO CALCULATIONS; ATOMIC LAYER DEPOSITION (ALD); BORON NITRIDE; LASER-ASSISTED LAYER DEPOSITION (LALD);

THIN FILMS;

EID: 22944488884     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.200506365     Document Type: Article

References (29)

1. R. T. Paine, C. K. Narula, Chem. Rev. 1990, 90, 73.
2. M. Karim, D. Cameron, Mater. Des. 1992, 13, 207.
3. K. Watanabe, T. Taniguchi, H. Kanda, Nat. Mater. 2004, 3, 404.
4. N. Pantibla, K. Luthra, J. Electrochem. Soc. 1992, 139, 12.
5. H. Ehrhardt, Surf. Coat. Technol. 1979, 74-75, 1995.
6. I. Konyashin, B. Joachim, F. Aldinger Chem. Vap. Deposition 1997, 3, 239.
7. W. J. Zhang, X. Jiang, S. Matsumoto, Appl. Phys. Lett. 2001, 79, 27.
8. M. Kuhr, S. Reinke, W. Kulisch, Diamond Relat. Mater. 1995, 4, 375.
9. H. Yang, C. Iwamoto, T. Yoshida, J. Appl. Phys. 2003, 2, 94.
10. A. Bartl, S. Bohr, R. Haubner, B. Lux, Int. J. Refract. Met. Hard Mater. 1996, 14, 145.
11. T. Matsuda, N. Uno, H. Nakae, T. Hirai, J. Mater. Sci. 1986, 21, 649.
12. T. Suntola, J. Hyärjinen, Annu. Rev. Sci. 1985, 15, 177.
13. J. Thomas, N. E. Weston, T. O'Connor, J. Am. Chem. Soc. 1963, 84, 4619.
14. B. Mårlid, M. Ottosson, U. Pettersson, K. Larsson, J.-O. Carlsson, C. K. Narula, Thin Solid Films 2002, 402, 167.
15. D. J. Ehrlich, J. Y. Tsao, Laser Microfabrication; Thin Film Processes and Lithography, Academic Press, Boston, MA 1989.
16. Q. Chen, C. Beyler, P. Dapkus, Appl. Phys. Lett. 1992, 60, 2418.
17. V. M. Donnelly, A. P. Baronavski, J. R. McDonald, Chem. Phys. 1979, 43, 1979.
18. J. Olander, K. Larsson, Phys. Rev. B: Condens. Matter 2003, 68, 075411.
19. K. Larsson, J.-O. Carlsson, J. Phys. Chem. 1999, 103, 6533.
20. H. Sachev, R. Haubner, H. Nöth, B. Lux, Diamond Relat. Mater. 1997, 6, 286.
21. J. D. Ferguson, A. W. Weimer, S. M. Geroge, Thin Solid Films. 2002, 413, 16.
22. E. Miesher, Helv. Phys. Acta 1935, 8, 279.
23. R. Sacher, W. Siebert, J. Nakovich, F. A. Miller, J. Raman Spectrosc. 1973, 1, 285.
24. P. Wang, S. Orimo, T. Matsumshima, H. Fujii, G. Majer, Appl. Phys. Lett. 2002, 80, 2.
25. P. Hohenberg, W. Kohn, Phys. Rev. 1964, 136, B864.
26. W. Kohn, L. J. Sham, Phys. Rev. 1965, 140, A1133.
27. G. Aylward, T. Finlay, SI Chemical Data, 3rd ed., Wiley, Singapore 1994.
28. T. Yanagihara, Diamond Relat. Mater. 2004, 13, 616.
29. P. Hezler, L. Landström, M. Lindstam, J.-O. Carlsson, J. Appl. Phys. 2001, 89, 3967.