Aluminum-induced crystallization of amorphous silicon: Influence of temperature profiles

Thin Solid Films

Volumn 487, Issue 1-2, 2005, Pages 107-112

  Schneider, J ^a   Heimburger, R ^a   Klein, J ^a   Muske, M ^a   Gall, S ^a   Fuhs, W ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

Aluminum; Crystallization; Nucleation; Silicon

Indexed keywords

ALUMINUM; ANNEALING; CRYSTALLIZATION; EUTECTICS; RECRYSTALLIZATION (METALLURGY); REDUCTION; SILICA; SOLAR CELLS; THERMAL EFFECTS; THIN FILMS;

CRYSTALLINE SILICON; ELECTRONIC QUALITY; METAL INDUCED CRYSTALLIZATION (MIC); THIN FILM FABRICATION;

AMORPHOUS SILICON;

EID: 22944443860     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.01.046     Document Type: Conference Paper

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