The high-speed measurement of a partial area imaging system applied to photoresist development processing

Journal of the Chinese Institute of Engineers, Transactions of the Chinese Institute of Engineers,Series A/Chung-kuo Kung Ch'eng Hsuch K'an

Volumn 28, Issue 4, 2005, Pages 721-726

  Lin, Chern Sheng ^a   Lay, Yun Long ^b   Chan, Shi Xiang ^a   Ho, Chien Wa ^c   Chiou, Yih Chih ^d  

^a FENG CHIA UNIVERSITY   (Taiwan)

^b Chin Yi Institute of Technology   (Taiwan)

^c NATIONAL UNITED UNIVERSITY   (Taiwan)

^d CHUNG HUA UNIVERSITY   (Taiwan)

Author keywords

Exposure and development time; High speed image inspection system; Photolithography

Indexed keywords

CAMERAS; CHARGE COUPLED DEVICES; INSPECTION; MICROSCOPES; PHOTOLITHOGRAPHY; PHOTORESISTS; SCANNING;

CCD CAMERAS; EXPOSURE AND DEVELOPMENT TIME; HIGH SPEED IMAGE INSPECTION SYSTEM; SCANNING PROBE MICROSCOPES (SPM);

IMAGING SYSTEMS;

EID: 22944434576     PISSN: 02533839     EISSN: 21587299     Source Type: Journal    
DOI: 10.1080/02533839.2005.9671039     Document Type: Article

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