Measuring the thermal properties of photoresist thin films using atomic force microscopy

Thin Solid Films

Volumn 273, Issue 1-2, 1996, Pages 308-311

  Kawai, Akira ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Atomic force microscopy; Evaporation; Hardness

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEFORMATION; EVAPORATION; FREE ENERGY; HARDNESS; MATHEMATICAL MODELS; SURFACES; THERMAL VARIABLES MEASUREMENT; THERMODYNAMIC PROPERTIES; THIN FILMS;

ADSORPTION FORCE; ELASTIC DEFORMATION; INDENTATION MODEL; KNOOP HARDNESS MEASUREMENT; PHOTORESIST THIN FILMS; SURFACE FREE ENERGY; SURFACE HARDNESS;

PHOTORESISTS;

EID: 0030079707     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)06793-0     Document Type: Article

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