Selective growth of monoatomic Cu rows at step edges on Si(111) substrates in ultralow-dissolved-oxygen water

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 44, Issue 16-19, 2005, Pages

  Tokuda, Norio ^a   Nishizawa, Masayasu ^b   Miki, Kazushi ^a,b,c   Yamasaki, Satoshi ^a,b   Hasunuma, Ryu ^a   Yamabe, Kikuo ^a  

^a UNIVERSITY OF TSUKUBA   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

AFM; Cu; Electrochemical reaction; Electroless deposition; IR; Nanowire; TXRF

Indexed keywords

ABSORPTION SPECTROSCOPY; ASPECT RATIO; ATOMIC FORCE MICROSCOPY; ELECTROCHEMISTRY; ELECTROLESS PLATING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NANOSTRUCTURED MATERIALS; OXYGEN; SILICON; SUBSTRATES; WATER;

NANOWIRES; TXRF;

COPPER;

EID: 22344442079     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.L613     Document Type: Article

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