Amorphous {100} platelet formation in (100) Si induced by hydrogen plasma treatment

Journal of Applied Physics

Volumn 81, Issue 1, 1997, Pages 74-77

  Hwang, Ki Hyun ^a,c   Park, Jin Won ^a   Yoon, Euijoon ^a   Whang, Ki Woong ^a   Lee, Jeong Yong ^b  

^a Seoul National University   (South Korea)

^b Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^c SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; DIFFUSION; ELECTRON CYCLOTRON RESONANCE; HYDROGEN; ION BOMBARDMENT; LOW TEMPERATURE EFFECTS; MORPHOLOGY; OXYGEN; PHOTOLUMINESCENCE; PLASMA APPLICATIONS; SEMICONDUCTING SILICON; TRANSMISSION ELECTRON MICROSCOPY;

AMORPHOUS PLATELET FORMATION; AMORPHOUS PLATELETS; HYDROGEN PLASMA TREATMENT;

CRYSTAL DEFECTS;

EID: 0030735488     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.364098     Document Type: Article

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