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Volumn 5732, Issue , 2005, Pages 37-44
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Carbon nanotube technologies for future ULSI via interconnects
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Author keywords
Carbon nanotube; Chemical Vapor Deposition; LSI interconnect; Via
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Indexed keywords
CARBON NANOTUBES;
CHEMICAL VAPOR DEPOSITION;
COBALT;
CRYSTALLIZATION;
ELECTRIC PROPERTIES;
ELECTRON DIFFRACTION;
LSI CIRCUITS;
MICROWAVE POWER TRANSMISSION;
OPTICAL INTERCONNECTS;
SEMICONDUCTOR GROWTH;
SILICON WAFERS;
BALLISTIC TRANSPORT;
LSI INTERCONNECTS;
STRESS MIGRATION;
VIA;
ULSI CIRCUITS;
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EID: 21844444090
PISSN: 16057422
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.580083 Document Type: Conference Paper |
Times cited : (2)
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References (13)
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