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Volumn 13, Issue 3, 2005, Pages 272-275

Experimental study of the spectrum at 11-20 nm of a laser-produced plasma source using water target

Author keywords

Laser produced plasma source; Soft X ray; Spectral measurement; Water target

Indexed keywords

ELECTRON TRANSITIONS; MONOCHROMATORS; NEODYMIUM LASERS; NOZZLES; PHOTODIODES; PLASMA SOURCES; SPECTRUM ANALYSIS; WATER;

EID: 21844441392     PISSN: 1004924X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (10)

References (9)
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    • Chinese source, Thesis P D, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences
    • NI Q L. Study on laser-produced plasma soft X-ray source with liquid aerosol spray target[D]. Thesis P D, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 2003. (in Chinese)
    • (2003)
    • Ni, Q.L.1
  • 2
    • 0033716210 scopus 로고    scopus 로고
    • Xenon liquid-jet laser-plasma source for EUV lithography
    • BJORN A M. HANSSON M B, OSCAR H G, et al. Xenon liquid-jet laser-plasma source for EUV lithography[J]. SPIE, 2000, 3997: 729-732.
    • (2000) SPIE , vol.3997 , pp. 729-732
    • Bjorn, A.M.1    Hansson, M.B.2    Oscar, H.G.3
  • 3
    • 0035764422 scopus 로고    scopus 로고
    • Compact high-average-power laser-plasma X-ray source by cryogenic targets
    • MOCHIZUKI T, SHIMOURA A, AMANO S, et al. Compact high-average-power laser-plasma X-ray source by cryogenic targets[J]. SPIE, 2001, 4504: 87-96.
    • (2001) SPIE , vol.4504 , pp. 87-96
    • Mochizuki, T.1    Shimoura, A.2    Amano, S.3
  • 4
    • 3843147186 scopus 로고    scopus 로고
    • EUV generation using water droplet target
    • LIN J Q, YASHIRO H, AOTA T, et al. EUV generation using water droplet target[J]. SPIE, 2004, 5374: 906-911.
    • (2004) SPIE , vol.5374 , pp. 906-911
    • Lin, J.Q.1    Yashiro, H.2    Aota, T.3
  • 5
    • 0034768873 scopus 로고    scopus 로고
    • Scaling-up a liquid water jet laser plasma source to high average power for extreme ultraviolet lithography
    • VOGT U, STIEL H, WILL I. Scaling-up a liquid water jet laser plasma source to high average power for extreme ultraviolet lithography[J]. SPIE, 2001, 4343: 87-93.
    • (2001) SPIE , vol.4343 , pp. 87-93
    • Vogt, U.1    Stiel, H.2    Will, I.3
  • 6
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    • Calibration of soft X-ray detector
    • Chinese source
    • CAO J H, NI Q L, CHEN B O. Calibration of soft X-ray detector[J]. Optics and Precision Engineering, 2004, 12(1): 118-121. (in Chinese)
    • (2004) Optics and Precision Engineering , vol.12 , Issue.1 , pp. 118-121
    • Cao, J.H.1    Ni, Q.L.2    Chen, B.O.3
  • 7
    • 19144370939 scopus 로고    scopus 로고
    • Data acquisition and processing in EUV with labview program
    • Chinese source
    • CAO J H, NI Q L, GONG Y, et al. Data acquisition and processing in EUV with labview program[J]. Optics and Precision Engineering, 2002, 10(6 suppl): 103-106. (in Chinese)
    • (2002) Optics and Precision Engineering , vol.10 , Issue.6 SUPPL. , pp. 103-106
    • Cao, J.H.1    Ni, Q.L.2    Gong, Y.3
  • 8
    • 84975571818 scopus 로고
    • New laser plasma source for extreme-ultraviolet lithography
    • JIN F, RICHARDSON M. New laser plasma source for extreme-ultraviolet lithography[J]. Appl. Opt., 1995, 34(25): 5750-5760.
    • (1995) Appl. Opt. , vol.34 , Issue.25 , pp. 5750-5760
    • Jin, F.1    Richardson, M.2
  • 9
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    • Characterization of a laser plasma water droplet EUV source
    • JIN F, RICHARDSON M, SHIMKAVEG G, et al. Characterization of a laser plasma water droplet EUV source[J]. SPIE, 1995, 2523: 81-87.
    • (1995) SPIE , vol.2523 , pp. 81-87
    • Jin, F.1    Richardson, M.2    Shimkaveg, G.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.