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Volumn 5720, Issue , 2005, Pages 78-85
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Design and fabrication of trihedral corner-cube arrays using analog exposure based on phase masks
a a a a |
Author keywords
Micro optics; Phase mask; Retro reflectors
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Indexed keywords
COATING TECHNIQUES;
ETCHING;
IMAGING SYSTEMS;
MACHINING;
MICROOPTICS;
PHOTOLITHOGRAPHY;
SENSORS;
HIGH ENERGY BEAM SENSITIVE (HEBS) GLASSES;
LASER SCANNING DEVICES;
PHASE MASKS;
RETRO-REFLECTORS;
ARRAYS;
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EID: 21844434954
PISSN: 16057422
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.591996 Document Type: Conference Paper |
Times cited : (2)
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References (3)
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