Analog micro-optics fabrication by use of a two-dimensional binary phase-grating mask

Optics Letters

Volumn 30, Issue 2, 2005, Pages 150-152

  Sung, Jinwon ^a   Hockel, Heidi ^a   Johnson, Eric G ^a  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MICRO-OPTICS FABRICATION; PHASE-MASK TECHNOLOGY; TWO-DIMENSIONAL BINARY PHASE-GRATING MASKS;

COMPUTER SIMULATION; DIFFRACTION GRATINGS; FABRICATION; FOURIER OPTICS; MASKS; MICROOPTICS; PHOTOLITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE;

PHOTORESISTS;

EID: 12844278682     PISSN: 01469592     EISSN: None     Source Type: Journal    
DOI: 10.1364/OL.30.000150     Document Type: Article

References (4)

1. A. K.-K. Wong, Resolution Enhancement Techniques in Optical Lithography, Vol. TT47 of SPIE Tutorial Texts (SPIE, Bellingham, Wash., 2001), Chap. 3.
2. W. Henke, W. Hoppe, H. J. Quenzer, P. Staudt-Fischbach, and B. Wagner, in Proceedings of Micro Electro Mechanical Systems 1994 (Institute of Electrical and Electronics Engineers, Piscataway, N.J., 1994), pp. 205-210.
3. M. Pitchumani, H. Hockel, W. Mohammed, and E. G. Johnson, Appl. Opt. 41, 10 (2002).
4. B. Morgan and C. M. Waits, IEEE J. Microelectromech. Syst. 13, 113 (2004).