Diffusion-less junctions and super halo profiles for PMOS transistors formed by SPER and FUSI gate in 45 nm physical gate length devices

Technical Digest - International Electron Devices Meeting, IEDM

Volumn , Issue , 2004, Pages 99-102

  Severi, S ^a,b   Anil, K G ^a   Pawlak, J B ^c   Duffy, R ^c   Henson, K ^a   Lindsay, R ^d   Lauwers, A ^a   Veloso, A ^a   De Marneffe, J F ^a   Ramos, J ^a   Camillo Castillo, R A ^e   Eyben, P ^a   Dachs, C ^c   Vandervost, W ^a   Jurczak, M ^a   Biesemans, S ^a   De Meyer, K ^a,b  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

^c PHILIPS RESEARCH LABORATORIES   (Netherlands)

^d INFINEON TECHNOLOGIES AG   (Germany)

^e UNIVERSITY OF FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GATE LEAKAGE; SCANNING SPREADING RESISTANCE MEASUREMENT (SSRM); SPER TECHNOLOGY; VOLTAGE DROP; DEPLETION REGION; DESIGN SPACES; DRIVE CURRENTS; GATE ELECTRODES; GATE-LENGTH; JUNCTION FORMATION; JUNCTION LEAKAGES; OFF STATE; PMOSFET;

DIELECTRIC MATERIALS; DIFFUSION; ELECTRIC POTENTIAL; ELECTRIC RESISTANCE; ELECTRODES; EXTRAPOLATION; GATES (TRANSISTOR); RAPID THERMAL ANNEALING; SCANNING; SEMICONDUCTOR DOPING; THERMAL EFFECTS; TRANSMISSION ELECTRON MICROSCOPY;

MOSFET DEVICES; REFRACTORY METAL COMPOUNDS;

EID: 21644473099     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)

1. T. Ito et al., "Improvement of Threshold Voltage Roll-off by Ultra shallow Junction Formed by Flash Lamp Annealing", VLSI Symp. Tech. Dig., 2003
2. A. Shima et al., "Self-limiting laser thermal process for ultra-shallow junction formation of 50-nm gate CMOS", IEDM Tech. Dig., pp.493, 2003
3. A. Oishi et al., "High Performance CMOSFET Technology for the 45nm generation", VLSI Symp. Tech. Dig., pp.166, 2004.
4. R. Lindsay et al., "SPER junction optimization in 45nm CMOS devices", IWJT, 2004.
5. 2 based high-k gate dielectrics as a candidate for low power applications", VLSI Symp. Tech. Dig., pp.190, 2004.