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Volumn , Issue , 2004, Pages 447-450

High-voltage extension (VBR ≥ 800 V) for smart-power SOI-technologies

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; COMPUTATIONAL COMPLEXITY; ELECTRIC POTENTIAL; ELECTRIC SWITCHES; INTEGRATED CIRCUITS; MICROPROCESSOR CHIPS;

EID: 21644459547     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (8)

References (7)
  • 5
    • 0026898739 scopus 로고
    • Anisotropic etching of Si in TMAH solutions
    • July
    • O. Tabata, "Anisotropic etching of Si in TMAH solutions", Sensors and Actuators A, vol. 34, pp. 51-57, July 1992.
    • (1992) Sensors and Actuators A , vol.34 , pp. 51-57
    • Tabata, O.1
  • 6
    • 0034156508 scopus 로고    scopus 로고
    • Dual-doped TMAH silicon etchant for microelectromechanical structures and systems applications
    • Mar/Apr
    • M. Paranjape, A. Pandy, S. Brida, L. Landsberger, M. Kahrizi, and M. Zen, "Dual-doped TMAH silicon etchant for microelectromechanical structures and systems applications", J. Vac. Sci. Technol. A, vol 18, pp. 738-742, Mar/Apr 2000.
    • (2000) J. Vac. Sci. Technol. A , vol.18 , pp. 738-742
    • Paranjape, M.1    Pandy, A.2    Brida, S.3    Landsberger, L.4    Kahrizi, M.5    Zen, M.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.