Silicon Carbide Micro- and Nanoelectromechanical Systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5342, Issue , 2004, Pages 1-7

  Mehregany, Mehran ^a   Zorman, Christian A ^a  

^a Case Western Reserve University   (United States)

Author keywords

Bulk micromachining; Epitaxial growth; Low pressure chemical vapor deposition; MEMS; NEMS; Silicon carbide; Surface micromachining

Indexed keywords

BULK MICROMACHINING; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; MEMS; NANOELECTROMECHANICAL SYSTEMS (NEMS); SURFACE MICROMACHINING;

CHEMICAL VAPOR DEPOSITION; EPITAXIAL GROWTH; MICROACTUATORS; MICROELECTRONICS; MICROMACHINING; RADIATION HARDENING; SEMICONDUCTOR MATERIALS; SILICON CARBIDE; SINGLE CRYSTALS; STOICHIOMETRY; THIN FILMS; WEAR RESISTANCE;

MICROELECTROMECHANICAL DEVICES;

EID: 2142771392     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.548920     Document Type: Conference Paper

References (8)

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2. C.A. Zorman, A.J. Fleischman, A.S. Dewa, M. Mehregany, C. Jacob, S. Nishino, and P. Pirouz, "Epitaxial growth of 3C-SiC films on 4 in. diam (100) silicon wafers by atmospheric pressure chemical vapor deposition", Journal of Applied Physics, vol. 78, pp. 5136-5138, 1995.
3. C.H. Wu, S. Stefanescu, H.I. Kuo, C.A. Zorman and M. Mehregany, "Fabrication and Testing of Single Crystalline 3C-SiC Piezoresistive Pressure Sensors", Technical Digest - 11th International Conference on Solid State Sensors and Actuators - Eurosensors XV, Munich, Germany, June 10-14, 2001, pp. 514-517.
4. th International Conference on Solid State Sensors, Actuators and Microsystems, Boston, MA, June 8-12, 2003, pp. 742-745.
5. X.M.H. Huang, C.A. Zorman, M. Mehregany, and M.L. Roukes, "Microwave-Frequency Nanoelectromechanical Systems", Nature, in vol. 421, pg. 496, (2003).
6. C.A. Zorman, S. Roy, C.H. Wu, A.J. Fleischman, and M. Mehregany, "Characterization of polycrystalline silicon carbide films grown by APCVD on polycrystalline silicon", Journal of Materials Research, vol. 13, pp. 406-412, 1998.
7. 4 by APCVD", Thin Solid Films, vol. 355-356, pp. 179-183, (1999).
8. C.A. Zorman, S. Rajgopal, X.A. Fu, R. Jezeski, J. Melzak, M. Mehregany, "Deposition of polycrystalline 3C-SiC films on 100 mm diameter (100) Si wafers in a large-volume LPCVD furnace", Electrochemical and Solid State Letters, vol. 5, pp. G99-G101, (2002).