Modeling of dielectric polarization during an electron beam exposure

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5398, Issue , 2004, Pages 186-193

  Borisov, S S ^a   Grachev, E A ^a   Zaitsev, S I ^b   Negulyaev, N N ^a   Cheremukhin, E A ^a  

^a MOSCOW STATE UNIVERSITY   (Russian Federation)

^b INSTITUTE OF MICROELECTRONICS TECHNOLOGY AND HIGH PURITY MATERIALS   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POTENTIAL; ELECTROMAGNETIC WAVE POLARIZATION; ELECTRON BEAM LITHOGRAPHY; ELECTRON MICROSCOPY; IMAGING TECHNIQUES; IONIZATION; MATHEMATICAL MODELS; MONTE CARLO METHODS; POLYMERIZATION; THIN FILMS;

DIELECTRIC POLARIZATION; PHOTOMASK IMAGING; SPATIAL ENERGY DISTRIBUTION;

ELECTRON BEAMS;

EID: 2142714514     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.552222     Document Type: Conference Paper

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