Improving resist resolution and sensitivity via electric-field enhanced postexposure baking

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 2, 2002, Pages 734-740

  Cheng, Mosong ^a   Yuan, Lei ^a   Croffie, Ebo ^a   Neureuther, Andrew ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION; ELECTRIC FIELD EFFECTS; ELECTRON BEAMS; LITHOGRAPHY; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THIN FILMS;

POSTEXPOSURE BAKING (PEB);

ACIDS;

EID: 0036505081     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1464835     Document Type: Article

References (5)