Thermally Activated Diffusion Observed by in Situ Reflection High Energy Electron Diffraction Intensity Monitoring on Interrupted SrTiO3 Homoepitaxial Growth

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 2, 2004, Pages 771-772

  Wang, Te Chun ^a   Juang, Jenh Yih ^a   Wu, Kaung Hsiung ^a   Uen, Tzeng Ming ^a   Gou, Yih Shun ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

Activation energy; Diffusion; Kinetics; Reflection high energy electron diffraction; RHEED

Indexed keywords

ACTIVATION ENERGY; ANNEALING; DIFFUSION; EPITAXIAL GROWTH; LASER ABLATION; MOLECULAR BEAM EPITAXY; MORPHOLOGY; NUCLEATION; STRONTIUM COMPOUNDS;

ANNEALING CURVES; ARRHENIUS PLOTS; HOMOEPITAXIAL GROWTH;

HIGH ENERGY ELECTRON DIFFRACTION;

EID: 2142653630     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.771     Document Type: Article

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