Annealing characteristics of pulsed laser deposited homoepitaxial SrTiO3 thin films

Surface Science

Volumn 488, Issue 3, 2001, Pages 277-285

  Lee, J Y ^a   Juang, J Y ^a   Wu, K H ^a   Uen, T M ^a   Gou, Y S ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

Atomic force microscopy; Epitaxy; Growth; Reflection high energy electron diffraction (RHEED)

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; EPITAXIAL GROWTH; FILM GROWTH; PULSED LASER DEPOSITION; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; STRONTIUM COMPOUNDS; THIN FILMS;

HOMOEPITAXY; STRONTIUM TITANATE;

DIELECTRIC FILMS;

EID: 0035839223     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(01)01087-1     Document Type: Article

References (18)