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Scripta Materialia

Volumn 53, Issue 6, 2005, Pages 663-667

Spark plasma sintering of silicon nitride/silicon carbide nanocomposites with reduced additive amounts

(3) Wan, Julin a,b Duan, Ren Guan a,c Mukherjee, Amiya K a

a University of California (United States)

b GE GLOBAL RESEARCH (United States)

c LOS ALAMOS NATIONAL LABORATORY (United States)

Author keywords

Ceramic matrix composites (CMC); High resolution electron microscopy (HREM); Nanocrystalline materials; Polymer processing; Rapid solidification

Indexed keywords

CERAMIC MATRIX COMPOSITES; GRAIN BOUNDARIES; NANOSTRUCTURED MATERIALS; PLASMA APPLICATIONS; RAPID SOLIDIFICATION; SILICON CARBIDE; SILICON NITRIDE; TRANSMISSION ELECTRON MICROSCOPY;

FIELD ASSISTED SINTERING TECHNIQUES (FAST); POLYMER PROCESSING; RESISTANCE HEATING; SPARK PLASMA SINTERING (SPS);

SINTERING;

EID: 21344470690 PISSN: 13596462 EISSN: None Source Type: Journal
DOI: 10.1016/j.scriptamat.2005.05.037 Document Type: Article

Times cited : (82)

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