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Volumn 375, Issue 7, 2003, Pages 929-934
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XPS, AES, and AFM as tools for study of optimized plasma functionalization
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Author keywords
AES; AFM; Functionalization; Plasma treatment; Polymer; Scratch resistance; XPS
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
AUGER ELECTRON SPECTROSCOPY;
ENZYMES;
OPTIMIZATION;
POLYMERS;
SURFACE TREATMENT;
SURFACES;
X RAY PHOTOELECTRON SPECTROSCOPY;
AES;
FUNCTIONALIZATION;
PLASMA TREATMENT;
SCRATCH RESISTANCE;
PLASMAS;
CONFERENCE PAPER;
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EID: 21344448152
PISSN: 16182642
EISSN: None
Source Type: Journal
DOI: 10.1007/s00216-003-1750-3 Document Type: Conference Paper |
Times cited : (17)
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References (48)
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