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Volumn 375, Issue 7, 2003, Pages 929-934

XPS, AES, and AFM as tools for study of optimized plasma functionalization

Author keywords

AES; AFM; Functionalization; Plasma treatment; Polymer; Scratch resistance; XPS

Indexed keywords

ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; ENZYMES; OPTIMIZATION; POLYMERS; SURFACE TREATMENT; SURFACES; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 21344448152     PISSN: 16182642     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00216-003-1750-3     Document Type: Conference Paper
Times cited : (17)

References (48)
  • 2
    • 0000964119 scopus 로고    scopus 로고
    • d'Agostino RD (ed) Plasma processing of polymers.
    • Ratner BD (1997) In: d'Agostino RD (ed) Plasma processing of polymers. NATO ASI-Ser. E: Applied Science 346:453
    • (1997) NATO ASI-ser. E: Applied Science , vol.346 , pp. 453
    • Ratner, B.D.1
  • 14
    • 0346114621 scopus 로고
    • Wingard L (ed), Wiley, New York
    • Falb RD (1972) In: Wingard L (ed), Enzyme engineering. Wiley, New York, p 177
    • (1972) Enzyme Engineering , pp. 177
    • Falb, R.D.1
  • 33
    • 0037051006 scopus 로고    scopus 로고
    • Krim J (2002) Surf Sci 500:741
    • (2002) Surf Sci , vol.500 , pp. 741
    • Krim, J.1
  • 37
    • 21344434588 scopus 로고    scopus 로고
    • German patent DE 19727857C1
    • Elkin B, Mayer J, Oehr C (1999) German patent DE 19727857C1
    • (1999)
    • Elkin, B.1    Mayer, J.2    Oehr, C.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.