A quantitative model for the surface restructuring of repeatedly plasma treated silicone rubber

Plasmas and Polymers

Volumn 2, Issue 1, 1997, Pages 41-51

  Everaert, Emmanuel P ^a   Chatelier, Ronald C ^a   Van Der Mei, Henny C ^a   Busscher, Henk J ^a  

^a UNIVERSITY OF GRONINGEN   (Netherlands)

Author keywords

Chain scission; Plasma treatment; Silicone rubber; Surface restructuring, crosslinking; Water contact angle

Indexed keywords

AMMONIA; ARGON; CARBON DIOXIDE; CONTACT ANGLE; CROSSLINKING; MATHEMATICAL MODELS; OXYGEN; PLASMA APPLICATIONS; REACTION KINETICS; SILICONES; SURFACE STRUCTURE; SURFACE TREATMENT;

CHAIN SCISSION; RADIO FREQUENCY PLASMA TREATMENT; SILICONE RUBBERS; SURFACE RECONSTRUCTION;

RUBBER;

EID: 0031101145     PISSN: 10840184     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02765659     Document Type: Article

References (2)

1. H. C. van der Mei, I. Stokroos, J. M. Schakenraad, and H. J. Busscher, J. Adhesion Sci. Technol. 5, 757-769 (1991).
2. M. Morra, E. Occhiello, R. Marola, F. Garbassi, P. Humphrey, and D. Johnson, J. Colloid Interface Sci. 137, 11-24 (1990).