|
Volumn 379, Issue 4, 2004, Pages 588-593
|
Characterizing single crystal surfaces using high resolution electron diffraction
|
Author keywords
Electron diffraction; Epitaxy; Reconstruction; Si(100); SPA LEED
|
Indexed keywords
DEPOSITION;
EPITAXIAL GROWTH;
LOW ENERGY ELECTRON DIFFRACTION;
MORPHOLOGY;
QUENCHING;
REACTION KINETICS;
SILICON;
SURFACE CHEMISTRY;
RECONSTRUCTION;
ROOM TEMPERATURE (RT);
SI(111);
SPA-LEED;
SINGLE CRYSTALS;
SILICON;
ARTICLE;
CHEMISTRY;
CRYSTALLIZATION;
INSTRUMENTATION;
MATERIALS TESTING;
METHODOLOGY;
SURFACE PROPERTY;
TRANSMISSION ELECTRON MICROSCOPY;
CRYSTALLIZATION;
MATERIALS TESTING;
MICROSCOPY, ELECTRON, TRANSMISSION;
SILICON;
SURFACE PROPERTIES;
|
EID: 21144456311
PISSN: 16182642
EISSN: None
Source Type: Journal
DOI: 10.1007/s00216-004-2547-8 Document Type: Conference Paper |
Times cited : (1)
|
References (28)
|