A simple optical system to optimize a high depth to width aspect ratio applied to a positive photoresist lithography process

Journal of Micromechanics and Microengineering

Volumn 7, Issue 3, 1997, Pages 118-120

  Conedera V ^a   Fabre, N ^a   Dilhan, M ^a  

^a LAAS CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; LIGHT ABSORPTION; OPTICAL SYSTEMS; OPTIMIZATION; PHOTORESISTS;

POSITIVE PHOTORESISTS;

MICROELECTROMECHANICAL DEVICES;

EID: 0031222567     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/7/3/009     Document Type: Article

References (9)

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