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Volumn 8, Issue 8 SPEC. ISS., 2005, Pages 1156-1173

Metal complexes-based molecular materials as thin films on silicon substrates

(11) de Caro, Dominique a Basso Bert, Mario a Casellas, Hélène a Elgaddari, Mohamed a Savy, Jean Philippe a Lamère, Jean François a Bachelier, Alice a Faulmann, Christophe a Malfant, Isabelle a Étienne, Michel a Valade, Lydie a

a LCC LABORATOIRE DE CHIMIE DE COORDINATION (France)

Author keywords

Chemical vapor deposition; Conductivity; Electrodeposition; Magnetism; Molecular materials; Silicon wafers; Thin films

Indexed keywords

BENZONITRILE; CHROMIUM DERIVATIVE; DITHIOL DERIVATIVE; METAL COMPLEX; MOLYBDENUM COMPLEX; NICKEL COMPLEX; NIOBIUM; ORGANOMETALLIC COMPOUND; SILICON; SOLVENT; TETRACYANOETHYLENE; TETRATHIAFULVALENE DERIVATIVE; TRANSITION ELEMENT; VANADIUM;

ABSORPTION SPECTROSCOPY; AIR; ARTICLE; CHEMICAL REACTION; CONTROLLED STUDY; ELECTRICITY; EXPOSURE; FILM; INFRARED SPECTROSCOPY; LOW TEMPERATURE; MAGNETISM; MATERIALS; MEASUREMENT; OXIDATION; RAMAN SPECTROMETRY; ROOM TEMPERATURE; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR; TEMPERATURE MEASUREMENT; THERMAL CONDUCTIVITY; VAPOR; VIBRATION; X RAY PHOTOELECTRON SPECTROSCOPY; X RAY POWDER DIFFRACTION;

EID: 21044447769 PISSN: 16310748 EISSN: None Source Type: Journal
DOI: 10.1016/j.crci.2004.11.014 Document Type: Article

Times cited : (14)

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